1. Heat resistance, under normal pressure, Wear resistant Si3N4 liner has no melting point, directly decomposed at about 1870℃, can withstand oxidation to 1400℃, the actual use of up to 1200℃ (more than 1200℃ mechanical strength will decrease).
2. Wear resistant silicon nitride liner with high mechanical strength, hardness close to corundum, self-lubrication wear resistance. The flexural strength at room temperature can be up to 980MPa, which can be compared with alloy steel, and the strength can be maintained to 1200 without decreasing.
3. Si3N4 silicon nitride liner with high thermal stability, small thermal expansion coefficient, high thermal conductivity, good thermal shock resistance, from room temperature to 1000℃ thermal shock will not crack.
4. High wear resistance Si3N4 chemical properties are stable, corrosion resistance, in addition to hydrofluoric acid does not react with other inorganic acid, the concentration of less than 30% caustic soda (NaOH) solution corrosion, can also withstand the erosion of a lot of organic substances, a variety of nonferrous metal melt (especially aluminum liquid is not wet), can withstand strong radiation irradiation. Under 800℃ dry atmosphere, it does not react with oxygen. Over 800℃, the silicon oxide film begins to be formed on the surface. As the temperature increases, the silicon oxide film gradually becomes stable, and the dense silicon oxide film can be formed with oxygen at about 1000℃. It can be kept basically stable up to 1,400℃.
5. High wear resistance Si3N4 chemical properties are stable, corrosion resistance, in addition to hydrofluoric acid does not react with other inorganic acid, the concentration of less than 30% caustic soda (NaOH) solution corrosion, can also withstand the erosion of a lot of organic substances, a variety of nonferrous metal melt (especially aluminum liquid is not wet), can withstand strong radiation irradiation. Under 800℃ dry atmosphere, it does not react with oxygen. Over 800℃, the silicon oxide film begins to be formed on the surface. As the temperature increases, the silicon oxide film gradually becomes stable, and the dense silicon oxide film can be formed with oxygen at about 1000℃. It can be kept basically stable up to 1,400℃.
6. High wear resistance Si3N4 chemical properties are stable, corrosion resistance, in addition to hydrofluoric acid does not react with other inorganic acid, the concentration of less than 30% caustic soda (NaOH) solution corrosion, can also withstand the erosion of a lot of organic substances, a variety of nonferrous metal melt (especially aluminum liquid is not wet), can withstand strong radiation irradiation. Under 800℃ dry atmosphere, it does not react with oxygen. Over 800℃, the silicon oxide film begins to be formed on the surface. As the temperature increases, the silicon oxide film gradually becomes stable, and the dense silicon oxide film can be formed with oxygen at about 1000℃. It can be kept basically stable up to 1,400℃.